PHOTORESISTS BASED ON A NOVEL PHOTOREARRANGEMENT OF O-NITROBENZYLIC POLYMERS
- Year : 1994 Author : AJAYAGHOSH, A; GEORGE, MV; YAMAOKA, T
- Research Area :Chemical Sciences and Technology Journal : JOURNAL OF MATERIALS CHEMISTRY A
- DOI :10.1039/jm9940401769
- Publication Date :