PHOTORESISTS BASED ON A NOVEL PHOTOREARRANGEMENT OF O-NITROBENZYLIC POLYMERS

  • Year : 1994 Author : AJAYAGHOSH, A; GEORGE, MV; YAMAOKA, T
  • Research Area :Chemical Sciences and Technology Journal : JOURNAL OF MATERIALS CHEMISTRY A
  • DOI :10.1039/jm9940401769
  • Publication Date :